With the 65-nanometer process technology node on the horizon, pressure is growing in the data preparation and mask manufacturing communities to create ways to handle an increasingly complex data flow.

Advanced nodes that have been leveraging curvilinear correction with technologies such as ILT and curvilinear OPC are increasingly requiring the use of curvilinear masks to meet advanced feature size ...

Data privacy regulations—coupled with the desire to pro­tect sensitive data—impose requirements on organizations to protect production data. Since many organizations rely on pro­duction data as a ...

The trend to reduce critical dimension sizes has in turn increased design file sizes, especially with the addition of optical proximity correction (OPC) steps. This extra data translates to a bigger ...